PhD position: Pushing the fundamental limits of the emission of EUV light by dense laser-produced-plasmas – Netherlands
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL’s research programme is presently formed by 8 research groups, and a large part of the research programme is devoted to physical and chemical processes crucial for nanolithography with extreme ultraviolet (EUV) […]
» Read more